Atomic Layer Deposition Systems
Dual chamber hot-wall reactors for both research and production.
Spector Ion Beam Deposition System
Dual ion beam deposition systems for high quality films.
RF and End Hall Ion Sources
Ion sources for cleaning, densification and etching of materials.
Thin Film Deposition and Etching Systems
Systems for PVD, ion beam etching, DLC and optical fiber metalization.
Atmospheric Rapid Thermal Processing Systems
Dual side heating with temperatures up to 1250 °C.
Research and production sputtering systems incorporating multiple target chambers.