Sputtering Systems
Research and production sputtering systems incorporating multiple target chambers
Wet Oxidation Furnace
Advanced solution dedicated to the oxidation phase in the manufacturing of VCSELS
Spector Ion Beam Deposition System
Dual ion beam deposition systems for high quality films
RF and End Hall Ion Sources
Ion sources for cleaning, densification and etching of materials
Thin Film Deposition and Etching Systems
Systems for PVD, ion beam etching, DLC and optical fiber metallization
Thin Film Coating Services
Range of Coating and Etching Services
Atmospheric Rapid Thermal Processing Systems
Dual side heating with temperatures up to 1250 °C
Clean, Coating and Curing Systems
Systems for plasma cleaning, monolayer coating, and vacuum curing
Vacuum and Atmospheric Wafer Load Systems
Manual and automated with multiple chamber options
RF Generators and Matching Networks
Range of RF Generators from 125W to 40KW in range of frequencies
Vacuum Chambers, Valves and Components
Range of Ozone generators
Transfer valves, APC Pendulum and Butterfly valves, Poppet valves, and Gate valves
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